SEMI-KLEEN plasma cleaner provides a gentle plasma cleaning solution for contamination control in high vacuum systems, such as SEM, FIB, AES, XPS, EBI, EBR, CD-SEM, etc.  It consists of a LCD touchscreen controller and a remote plasma source. Remote plasma source should be installed on the vacuum chamber to be cleaned.  Controller provides the RF power to the remote plasma source. It breaks down the process gas such as oxygen, hydrogen or other gas mixtures and generates reactive radicals. Radical species will then diffuse into the chamber to be cleaned and react with the contaminants. The byproducts are usually low molecule weight, high vapor pressure molecules that can be easily pumped away. Remote plasma cleaner can clean vacuum systems and samples at the same time.